Nonvolatile semiconductor memory device and producing method thereof

ABSTRACT

A cell array includes a memory cell region in which memory cells are formed and a peripheral region that is provided around the memory cell region. In the memory cell region, first lines are extended in parallel with a first direction, and the first lines are repeatedly formed at first intervals in a second direction orthogonal to the first direction. In the peripheral region, each of the first lines located at (4n−3)-th (n is a positive integer) and (4n−2)-th positions in the second direction from a predetermined position has a contact connecting portion on one end side in the first direction of the first line. In the peripheral region, each of the first lines located at (4n−1)-th and 4n-th positions in the second direction from the predetermined position has the contact connecting portion on the other end side in the first direction of the first line. The contact connecting portion is formed so as to contact a contact plug extended in a laminating direction.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is based upon and claims the benefit of priority fromthe prior Japanese Patent Application No. 2008-208421, filed on Aug. 13,2008, the entire contents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a nonvolatile semiconductor memorydevice having a multi-layer structure in which cross-point memory cellsare laminated and a producing method thereof.

2. Description of the Related Art

Conventionally, a flash memory is well known as anelectrically-rewritable nonvolatile memory. In the flash memory, NANDconnection or NOR connection of memory cells having floating gatestructures is established to form a memory cell array. A ferroelectricmemory is also well known as a nonvolatile, high-speed random accessmemory.

On the other hand, a resistance change type memory in which a variableresistive element is used in the memory cell is proposed as a techniqueof further achieving a finer design rule of the memory cell. Examples ofthe variable resistive element include a phase-change memory element inwhich a resistance value is changed according to a state change betweencrystalline state and an amorphous state of a chalcogenide compound, anMRAM element in which a resistance change of a tunnel magnetoresistiveeffect is used, a memory element of a polymer ferroelectric RAM (PFRAM)in which the resistive element is made of a conductive polymer, and anReRAM element in which the resistance change is generated by electricpulse application (for example, see Japanese Patent ApplicationLaid-Open No. 2006-344349, paragraph [0021]).

In the resistance change type memory, because the memory cell can beformed by a series circuit of a Schottky diode and a resistance changeelement instead of a transistor, advantageously a three-dimensionalstructure is formed by ease lamination to achieve the furtherintegration (for example, see Japanese Patent Application Laid-Open No.2005-522045).

However, even if the resistance change type memory is used, there is alimitation to L/S (Line/Space) of about 40 nm of the memory cell arrayin a current lithography technique. Therefore, there is a demand for thefiner design rule of the memory cell.

SUMMARY OF THE INVENTION

A nonvolatile semiconductor memory device according to one aspect of thepresent invention including: a semiconductor substrate; and a cell arrayformed on the semiconductor substrate, including a plurality of firstlines, a plurality of second lines intersecting the plurality of firstlines, and a plurality of memory cells connected at intersections of thefirst and second lines between both lines, wherein the cell arrayincludes: a memory cell region where the memory cells are formed; and aperipheral region that is provided around the memory cell region, in thememory cell region, the first lines are extended in parallel with afirst direction, and the first lines are repeatedly formed at firstintervals in a second direction orthogonal to the first direction, inthe peripheral region, each of the first lines located at (4n−3)-th (nis a positive integer) and (4n−2)-th positions in the second directionfrom a predetermined position has a contact connecting portion on oneend side in the first direction of the first line, in the peripheralregion, each of the first lines located at (4n−1)-th and 4n-th positionsin the second direction from the predetermined position has the contactconnecting portion on the other end side in the first direction of thefirst line, and the contact connecting portion is formed so as tocontact with a contact plug extended in a laminating direction.

A nonvolatile semiconductor memory device according to another aspect ofthe present invention including: a semiconductor substrate; and a cellarray formed on the semiconductor substrate, including a plurality offirst lines, a plurality of second lines intersecting the plurality offirst lines, and a plurality of memory cells connected at intersectionsof the first and second lines between both lines, wherein the cell arrayincludes: a memory cell region where the memory cells are formed; and aperipheral region that is provided around the memory cell region, in thememory cell region, the first lines are extended in parallel with afirst direction, and the first lines are repeatedly formed at firstintervals in a second direction orthogonal to the first direction, inthe peripheral region, each plurality of continuous first linesalternately have contact connecting portions one end side and the otherend side in the first direction of the first line, and the contactconnecting portion is formed so as to contact with a contact plugextended in a laminating direction.

A nonvolatile semiconductor memory device producing method according tostill another aspect of the present invention including: forming alaminated structure on a semiconductor substrate; and etching thelaminated structure to form a cell array, the cell array including aplurality of first lines, a plurality of second lines intersecting theplurality of first lines, and a plurality of memory cells connected atintersections of the first and second lines between both lines, whereinthe method compises: forming a first mask on the laminated structure,forming a second mask having a predetermined pattern on a layer upperthan a layer in which the first mask is formed, slimming the secondmask, forming a third mask on a sidewall of the second mask, removingthe second mask in a first region, etching the first mask and thelaminated structure by means of the third mask in the first region, andetching the first mask and the laminated structure by means of the thirdmask and the second mask in a second region that is different from thefirst region.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram illustrating a nonvolatile semiconductormemory device according to a first embodiment of the present invention;

FIG. 2A is a perspective view illustrating a memory cell array 1 (unitcell array MAT00 to MAT04) of the nonvolatile semiconductor memorydevice of the first embodiment;

FIG. 2B is a partially enlarged perspective view (perspective viewillustrating the unit cell array MAT01) illustrating the memory cellarray 1 of FIG. 2A;

FIG. 3A is a sectional view taken on a line I-I′ of FIG. 2B;

FIG. 3B illustrates a specific example of an ohmic element NO of FIG.2B;

FIG. 4 is a sectional view schematically illustrating an example of avariable resistive element of the first embodiment;

FIG. 5 is a sectional view illustrating a laminated structure of theunit cell array MAT01 of the first embodiment;

FIG. 6A is a top view illustrating a first metal 27 and a second metal36;

FIG. 6B is a top view illustrating the first metal 27 and the secondmetal 36;

FIG. 6C is a top view illustrating the first metal 27 and the secondmetal 36;

FIG. 7 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of the first embodiment;

FIG. 8 is a perspective view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 9 is a perspective view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 10 is a perspective view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 11 is a perspective view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 12 is a perspective view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 13 is a perspective view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 14A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 14B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 15 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 16 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 17A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 17B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 18 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 19A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 19B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 20 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 21A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 21B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 22A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 22B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 23A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 23B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 24 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 25A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 25B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 26 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 27A is a top view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 27B is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 28 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 29 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 30 is a sectional view illustrating a process for producing thenonvolatile semiconductor memory device of the first embodiment;

FIG. 31 is a top view illustrating a first metal 27′ and a second metal36′ of a nonvolatile semiconductor memory device according to a secondembodiment of the present invention;

FIG. 32 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of the second embodiment;

FIG. 33 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of a third embodiment of thepresent invention

FIG. 34 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of a fourth embodiment of thepresent invention;

FIG. 35 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of a fifth embodiment of thepresent invention;

FIG. 36 is a perspective view illustrating a unit cell array MATa1according to a sixth embodiment of the present invention;

FIG. 37 is a sectional view taken on a line II-II′ of FIG. 36;

FIG. 38 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of the sixth embodiment;

FIG. 39 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of a seventh embodiment of thepresent invention; and

FIG. 40 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of an eighth embodiment of thepresent invention.

FIG. 41 is a view illustrating a first metal 27AA and a second metal36AA of an other embodiment of the present invention.

FIG. 42 is a view illustrating a first metal 27AB and a second metal36AB of an other embodiment of the present invention.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Exemplary embodiments of the present invention will be described belowwith reference to the drawings.

First Embodiment Schematic Configuration of Nonvolatile SemiconductorMemory Device of First Embodiment

A schematic configuration of a nonvolatile semiconductor memory deviceaccording to a first embodiment of the present invention will bedescribed with reference to FIGS. 1 to 4. FIG. 1 is a block diagramillustrating a nonvolatile semiconductor memory device (nonvolatilememory) of the first embodiment.

The nonvolatile semiconductor memory device of the first embodimentincludes a memory cell array 1 in which memory cells are arranged in amatrix shape, and a later-mentioned ReRAM (variable resistive element)is used in the memory cell. A column control circuit 2 is providedadjacent to the memory cell array 1 in a direction of a bit line BL. Thecolumn control circuit 2 controls the bit line BL of the memory cellarray 1, erases data of the memory cell, writes the data in the memorycell, and reads the data from the memory cell. A row control circuit 3is provided adjacent to the memory cell array 1 in a direction of a wordline WL. The row control circuit 3 selects the word line WL of thememory cell array 1, erases the data of the memory cell, writes the datain the memory cell, and applies a voltage necessary to read the datafrom the memory cell.

A data input and output buffer 4 is connected to an external host (notillustrated) through an I/O line. The data input and output buffer 4receives write data, an erase command, an address data, and a commanddata, and the data input and output buffer 4 supplies read data. Thedata input and output buffer 4 transmits the received write data to thecolumn control circuit 2, and the data input and output buffer 4receives the data read from the column control circuit 2 and suppliesthe data to the outside. An address supplied from the outside to thedata input and output buffer 4 is transmitted to the column controlcircuit 2 and the row control circuit 3 through an address register 5. Acommand supplied from the host to the data input and output buffer 4 istransmitted to a command interface 6. The command interface 6 receivesan external control signal from the host, and the command interface 6determines whether the data fed into the data input and output buffer 4is the write data, the command, or the address. When the data is thecommand, the command interface 6 receives the command and transfers thecommand as a command signal to a state machine 7. The state machine 7manages the whole of, the nonvolatile memory. The state machine 7receives the command from the host, and performs read, write, and eraseof the command and management of data input and output. The externalhost receives status information managed by the state machine 7, and theexternal host can make a determination of operation result. The statusinformation is also utilized in controlling the data write and erase.

The state machine 7 controls a pulse generator 9. The control enablesthe pulse generator 9 to supply a pulse at arbitrary timing with anarbitrary voltage. The pulse can be transferred to an arbitraryinterconnection that is selected by the column control circuit 2 and therow control circuit 3.

Peripheral circuit elements except for the memory cell array 1 can beformed on a silicon substrate immediately below the memory array 1formed in an interconnection layer, and therefore a chip area of thenonvolatile memory can substantially be equalized to an area of thememory cell array 1.

FIG. 2A is a perspective view of the memory cell array 1. FIG. 2B is apartially enlarged perspective view of the memory cell array 1. FIG. 3Ais a sectional view of one memory cell taken on a line I-I′ of FIG. 2B.

Referring to FIG. 2A, the memory cell array 1 is divided into four unitcell arrays MAT01 to MAT04. Each of the unit cell arrays MAT01 to MAT04has a part of the memory cell array 1. The unit cell arrays MAT01 toMAT04 are disposed while three-dimensionally laminated as illustrated inFIG. 2A (the unit cell arrays MAT01 to MAT04 are disposed from a lowerlayer to an upper layer). FIG. 2A illustrates the memory cell array 1 byway of example only. The memory cell array 1 may have at least four unitcell arrays. In the memory cell array 1, the unit cell arrays may bedisposed in a two-dimensional direction.

As illustrated in FIG. 2A, the unit cell array MAT01 includes pluralword lines WL0 ia (in FIG. 2A, i=0 to 2) and plural bit lines BLia.Similarly, as illustrated in FIG. 2A, the unit cell array MAT02 includesplural word lines WLib and plural bit lines BLib. The unit cell arrayMAT03 includes plural word lines WLi and plural bit lines BLic. The unitcell array MAT04 includes plural word lines WLid and plural bit linesBLid. In FIG. 2A, “i” is set in the range of 0 to 2 by way of example.Alternatively “i” may be set at 3 or more.

The plural word lines WLia are arranged in parallel with one another.The plural bit lines BLia are arranged in parallel with one anotherwhile intersecting the plural word lines WLia. A memory cell MC isdisposed at each intersecting portion so as to be sandwiched between theinterconnections. Desirably the word line WLia and the bit line BLia ismade of a heat-resistant, low-resistance material such as W, WSi, NiSi,and CoSi. The plural word lines WLib, WLic, and WLid have the sameconfiguration as the word line WLia. The plural bit lines BLib, the bitline BLic, and the bit line BLid have the same configuration as the bitline BLia.

Referring to FIG. 3A, the memory cell MC includes a circuit of avariable resistive element VR and a non-ohmic element NO are connectedin series.

In the variable resistive element VR, a resistance value can be changedby voltage application through an electric current, heat, chemicalenergy, and the like. Electrodes EL1 and EL2 that acts as a barriermetal and a bonding layer are disposed on and beneath the variableresistive element VR. Examples of the electrode material include Pt, Au,Ag, TiAlN, SrRuO, Ru, RuN, Ir, Co, Ti, TiN, TaN, LaNiO, Al, PtIrOx,PtRhOx, and Rh/TaAlN. A metal film may be inserted so as to uniformorientation. A buffer layer, a barrier metal layer, and a bonding layermay separately be inserted.

A composite compound whose resistance value is changed by movement of acontaining positive ion becoming a transition element (ReRAM) can beused as the variable resistive element VR.

Referring to FIG. 3B, the non-ohmic element NO has (a) a MIM(Metal-Insulator-Metal) structure, (b) a PIN structure (P+Poly-silicon-Intrinsic-N+ Poly-silicon), and the like. Electrodes EL2and EL3 that acts as the barrier metal layer and the bonding layer maybe disposed on and beneath the variable resistive element VR. In thecase of the MIM structure, a bipolar operation can be performed. In thecase of the PIN structure (diode structure), a unipolar operation can beperformed due to characteristics thereof.

FIG. 4 illustrates an example of the variable resistive element. In thevariable resistive element VR of FIG. 4, a recording layer 12 isdisposed between electrode layers 11 and 13. The recording layer 12 ismade of a composite compound containing at least two kinds of thepositive ion elements. The transition element having a d orbital that isincompletely filled with electrons is used as at least one kind of thepositive ion element, and the shortest distance between the adjacentpositive ion elements is 0.32 nm or less. Specifically, the compositecompound is expressed by a chemical formula AxMyXz (A and M are elementsdifferent from each other), and the composite compound is formed bymaterials having crystal structures such as a spinel structure (AM₂O₄),an ilmenite structure (AMO₃), a delafossite structure (AMO₂) a LiMoN₂structure (AMN₂), a wolframite structure (AMO₄), an olivine structure(A₂MO₄), a hollandite structure (AxMO₂), a ramsdellite structure(AxMO₂), and a perovskite structure (AMO₃).

In the example of FIG. 4, A is zinc (Zn), M is manganese (Mn), and X isoxygen (O). A small white circle in the recording layer 12 indicates adiffuse ion (Zn), a large white circle indicates a negative ion (O), andsmall black circle indicates a transition element ion (Mn). An initialstate of the recording layer 12 is in a high-resistance state. When anegative voltage is applied onto the side of the electrode layer 13while the electrode layer 11 is set at a fixed potential, the diffuseions in the recording layer 12 are partially moved onto the side of theelectrode layer 13, and the diffuse ions in the recording layer 12 isdecreased relative to the negative ions. The diffuse ions moved onto theside of the electrode layer 13 receive electrons from the electrodelayer 13, and the diffuse ions are deposited as metal, thereby formingthe metal layer 14. In the recording layer 12, the negative ions becomeexcessive, which increases a valence number of the transition elemention. Therefore, the recording layer 12 has electron conductivity bycarrier injection, and a setting operation is completed. Inreproduction, a minute electric current may be passed to an extent inwhich the resistance change is not generated in the material of therecording layer 12. In order to reset a program state (low-resistancestate) to the initial state (high-resistance state), for example, alarge current may sufficiently be passed through the recording layer 12to perform Joule heating, and thereby promoting an oxidation-reductionreaction of the recording layer 12. Alternatively, the reset operationmaybe performed by applying an electric field in an opposite directionto the setting operation.

Specific Configuration of Nonvolatile Semiconductor Memory Device ofFirst Embodiment

A specific configuration of the nonvolatile semiconductor memory deviceof the first embodiment will be described with reference to FIGS. 5 to7. FIG. 5 is a partially sectional view illustrating the nonvolatilesemiconductor memory device constituting the unit cell array MAT01.

Referring to FIG. 5, an impurity diffused layer 23 and agate electrode24 of a transistor constituting the peripheral circuit are formed on asilicon substrate 21 in which a well 22 is formed. A first interlayerinsulator 25 is deposited on the impurity diffused layer 23 and the gateelectrode 24. A via 26 that reaches a surface of the silicon substrate21 is appropriately made in the first interlayer insulator 25. A firstmetal 27 constituting the word line WLia of the memory cell array 1 isformed on the first interlayer insulator 25, and the first metal 27 ismade of low-resistance metal such as tungsten (W). A barrier metal 28 isformed on the first metal 27. The barrier metal may be formed beneaththe first metal 27. The barrier metal may be made of one of or both Tiand TiN. A non-ohmic element 29 such as a diode is formed on the barriermetal 28. In addition to the above-described configuration, aninterconnection layer including one or two layers may be formed on thefirst interlayer insulator layer 25.

A first electrode 30, a variable resistive element 31, and a secondelectrode 32 are formed on the non-ohmic element 29 in this order.Therefore, the barrier metal 28 to the second electrode 32 are formed asthe memory cell MC. The barrier metal may be inserted beneath the firstelectrode 30 and on the second electrode 32, or the barrier metal andthe bonding layer may be inserted beneath the second electrode 32 and onthe first electrode 30. A gap between the adjacent memory cells MC isfilled with a second interlayer insulator 34 and a third interlayerinsulator 35 (however, the second interlayer insulator 34 is notillustrated in FIG. 5). A second metal 36 is formed on each memory cellMC of the memory cell array, and the second metal 36 constitutes the bitline BLia that is extended in a direction orthogonal to the word lineWLia. Thus, the nonvolatile memory that is of a variable resistivememory is formed. In order to realize the multi-layer structure, thelamination from the barrier metal 28 to the second electrode 32 and theformation of the second and third interlayer insulators 34 and 35between the memory cells MC may be repeated only as needed.

FIGS. 6A to 6C are top views illustrating the first metal 27 (word lineWLia). For the second metal 36 (bit line BLia), a basic pattern isalmost the same only except that the direction in which theinterconnection is extended is different by 90° from that of the firstmetal 27. Therefore, the case of the second metal 36 is described by thenumeral in a parenthesis just for reference. FIG. 6A illustrates amemory cell region Ar1 where the memory cell MC is provided, and FIGS.6B and 6C illustrate a peripheral region Ar2 provided around the memorycell region Ar1. A contact plug extended in a laminating direction isprovided in the peripheral region Ar2.

Referring to FIG. 6A, in the memory cell region Ar1, the first metal 27is extended in parallel with a row direction, and the first metal 27includes linear portions 27 a that are arranged at first intervals (forexample, 40 nm or less) in a column direction (direction orthogonal tothe row direction) In the memory cell region Ar1, the second metal 36that is extended in the direction orthogonal to the first metal 27 isprovided above the first metal 27, and the memory cell MC is formed inthe intersecting portion of the first metal 26 and the second metal 36.

Referring to FIG. 6B, in the peripheral region Ar2, each of the firstmetals 27 located at (4n−3)-th (n is a positive integer) and (4n−2)-thpositions in the column direction from the predetermined position has acontact connecting portion 27 b on one end side in the row directionthereof.

Referring to FIG. 6C, in the peripheral region Ar2, each of the firstmetals 27 located at (4n−1)-th and 4n-th positions in the columndirection from the predetermined position has a contact connectingportion 27 b on the other end side in the row direction thereof. Thatis, each two of the first metals 27 alternately form the contactconnecting portions 27 b in the peripheral region Ar2 at both endsthereof.

The contact connecting portion 27 b is formed so as to contact thecontact plug extended in the laminating direction. The contactconnecting portion 27 b is integral with the linear portion 27 a. Thecontact connecting portion 27 b has a width in the column direction,which is larger than that of the linear portion 27 a.

As illustrated in FIGS. 6B and 6C, in the peripheral region Ar2, thefirst metal 27 includes an island portion 27 c that is adjacent to thecontact connecting portion 27 b in the row direction. The island portion27 c is provided while separated from the linear portion 27 a and thecontact connecting portion 27 b. The island portion 27 c is formed so asto contact the contact plug.

In the first embodiment, the first metal 27, the row direction, and thecolumn direction correspond to the first line, the first direction, andthe second direction, respectively.

On the other hand, as illustrated in FIG. 6A, in the memory cell regionAr1, the second metal 36 is extended in parallel with the columndirection, and the second metal 36 includes linear portions 36 a thatare arranged at first intervals (for example, 40 nm or less) in the rowdirection.

As illustrated in FIG. 6B, in the peripheral region Ar2, each of thesecond metals 36 located at (4n−3)-th (n is a positive integer) and(4n−2)-th positions in the row direction from the predetermined positionhas a contact connecting portion 36 b on one end side in the columndirection thereof.

As illustrated in FIG. 6C, in the peripheral region Ar2, each of thesecond metals 36 located at (4n−1)-th and 4n-th positions in the rowdirection from the predetermined position has the contact connectingportion 36 b on the other end side in the column direction thereof. Thatis, each two of the second metals 36 alternately form the contactconnecting portions 36 b in the peripheral region Ar2 at both endsthereof.

The contact connecting portion 36 b is formed so as to contact thecontact plug extended in the laminating direction. The contactconnecting portion 36 b is integral with the linear portion 36 a. Thecontact connecting portion 36 b has a width in the row direction, whichis larger than that of the linear portion 36 a.

As illustrated in FIGS. 6B and 6C, in the peripheral region Ar2, thesecond metal 36 includes an island portion 36 c that is adjacent to thecontact connecting portion 36 b in the column direction. The islandportion 36 c is provided while separated from the linear portion 36 aand the contact connecting portion 36 b. The island portion 36 c isformed so as to contact the contact plug.

In the first embodiment, the second metal 36, the row direction, and thecolumn direction correspond to the first line, the second direction, andthe first direction, respectively.

FIG. 7 is a view schematically illustrating the contact plug of thefirst embodiment. Referring to FIG. 7, an upper-layer portion is formedon a silicon substrate 51 while roughly including 11 layers (first layerL1 to eleventh layer L11).

The unit cell arrays MAT01 to MAT04 are formed in the third layer L3 tothe ninth layer L9. The word line WLia includes the linear portion 27 a,the contact connecting portion 27 b, and the island portion 27 c. Thebit line BLia includes the linear portion 36 a, the contact connectingportion 36 b, and the island portion 36 c.

The word line WLia, the bit line BLia, the word line WLib, the bit lineBLib, the word line WLic, the bit line BLic, the word line WLid, and thebit line BLid are formed in a lower portion of each of the third layerL3 to the tenth layer L10, respectively.

As illustrated in FIG. 7, the nonvolatile semiconductor memory device ofthe first embodiment includes contact plugs ZW11 to ZW14, ZW21 to ZW23,ZW31 to ZW33, ZW41, ZW42, ZW51, ZW52, ZW61, ZW71, and ZW81 thatelectrically connect the word lines WLia to WLid to one another in thelaminating direction. The nonvolatile semiconductor memory device of thefirst embodiment includes contact plugs ZB1 to ZB5 that electricallyconnect the bit lines BL1 a to BL1 d to one another in the laminatingdirection.

Contact plugs CS and V1 and metal interconnections M0 and M1 are formedin the first layer L1 so as to be extended from the upper surface of thefirst layer L1 to the silicon substrate 51, and the contact plugs CS andV1 and the metal interconnections M0 and M1 constitute a lower-layerinterconnection unit. The word lines WL1 a to WL1 d and the bit linesBL1 a to BL1 d are connected through the lower-layer interconnectionunit to peripheral circuits such as a row decoder which are formed inthe silicon substrate 51.

At this point, for example, it is assumed that the description of “X1 toX2→Y1 to Y2” is given when a contact plug X1 to a contact plug X2 areformed in a Y1-th layer to a Y2-th layer. According to the description,a relationship between the contact plug of the first embodiment and theformed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZW11 to ZW14→L2-   ZW21 to ZW23→L3-   ZW31 to ZW33→L4-   ZW41 to ZW42→L5-   ZW51 to ZW5→L6-   ZW61→L7-   ZW71→L8-   ZW81→L9 to L10-   ZB1→L2 to L3-   ZB2→L4 to L5-   ZB3→L6 to L7-   ZB4→L8 to L9-   ZB5→L10

For example, it is assumed that the description of “Z(27 b)-X-M1” isgiven when the contact connecting portion 27 b of the word line Z isconnected to a metal interconnection M1 through a contact plug X. Theisland portion 27 c of the word line Z is described as “Z(27 c)”.According to the description, a connection relationship by the contactplug of the first embodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   WLia(27 b)-ZW11-M1-   WLib(27 b)-ZW31-BLia(36 c)-ZW21-WLia(27 c)-ZW12-M1 p0 WLic(27    b)-ZW51-BLib(36 c)-ZW41-WLib(27 c)-ZW32-BLia(36 c)-ZW22-WLia(27    c)-ZW13-M1-   WLid(27 b)-ZW71-BLic(36 c)-ZW61-WLic(27 c)-ZW52-BLib(36    c)-ZW42-WLib(27 c)-ZW33-BLia(36 c)-ZW23-WLia(27 c)-ZW14-M1-   ZB5-BLid(36 b)-ZB4-BLic(36 b)-ZB3-BLib(36 b)-ZB2-BLia(36 b)-ZB1-M1

Process for Producing Nonvolatile Semiconductor Memory Device of FirstEmbodiment

A process for producing the nonvolatile semiconductor memory device ofthe first embodiment will be described below. The following producingprocess describes a process of forming the unit cell array MAT01. Theunit cell arrays MAT02 to MAT04 are produced through the same formingprocess as the unit cell array MAT01.

An FEOL (Front End Of Line) process is performed to form the transistorsconstituting the necessary peripheral circuits on the silicon substrate21, and the first interlayer insulator 25 (see FIG. 5) is deposited onthe transistors.

Then the upper-layer portion from the first metal 27 is formed.

FIGS. 8 to 13 are perspective views illustrating a process for producingthe upper-layer portion in the process order. The process for producingthe upper-layer portion will be described with reference to FIGS. 8 to13.

As described above, when the first interlayer insulator 25 is formed, alayer 27A constituting the first metal 27 of the memory cell array 1 isdeposited on the first interlayer insulator 25, a layer 28A constitutingthe barrier metal 28 is formed, a layer 29A constituting the non-ohmicelement 29 is deposited, a layer 30A constituting the first electrode 30is deposited, a layer 31A constituting the variable resistive element 31is deposited, and a layer 32A constituting the second electrode 32 isdeposited. Therefore, the laminated structure of the upper-layer portionof FIG. 8 is formed.

Then, a hard mask (not illustrated) of a TEOS film is formed in theupper surface of the laminated structure, and first anisotropic etchingis performed with the hard mask to form a trench T1 along the word lineWL as illustrated in FIG. 9, thereby separating the laminated body.

Then the second interlayer insulator 34 is embedded in the trench T1. Amaterial having a good insulating property, a low capacitance, and agood embedding property is suitable to the second interlayer insulator34. Then a planarization process is performed by CMP to perform removalof the excess second interlayer insulator 34 and exposure of the upperelectrode 32. FIG. 10 is a sectional view after the planarizationprocess is performed. A protective film may be formed by oxidizing andnitriding a sidewall of the trench T1 before the second interlayerinsulator 34 is formed. The formation of the protective film can preventthe oxidation.

A layer 36A made of tungsten that constitutes the second metal 36 islaminated on the planarized portion after CMP. FIG. 11 illustrates thestate after the layer 36A is laminated.

Then, the hard of the TEOS film is formed on the layer 36A, and secondetching is performed with L/S in the direction orthogonal to the firstetching. Therefore, as illustrated in FIG. 12, a trench T2 is formedalong the word line WLia orthogonal to the bit line BLia, and the memorycell MC that is separated into a columnar shape is simultaneously formedin a self-aligned manner at a cross point of the bit line BLia and theword line WLia. Then, as illustrated in FIG. 13, a cross-point typememory array layer is formed by the embedment and planarization of thethird interlayer insulator 35.

After the films are laminated, the patterning processes are performedtwice in the directions orthogonal to each other, whereby thecross-point cell portion is formed in the self-aligned manner with nomisalignment. In order to achieve the finer design rule of the memorycell, L/S is a key factor for the finer design rule.

A process for forming the finer laminated structure illustrated in FIGS.11 and 12 will be described in detail with reference to FIGS. 14A to 30.In FIGS. 14A to 30, FIGS. 14A, 17A, 19A, 21A, 22A, 23A, 25A, and 27A areplan views, and other drawings are sectional view illustrating portionsspecified by regions A-A′ to S-S′ in the plan views.

Referring to FIGS. 14A and 14B, a hard mask layer (SiO₂) 41, a siliconnitride mask layer (SiN) 42, a sacrifice layer (SiO₂) 43, an amorphoussilicon mask layer (a-Si) 44, an antireflection coating layer (ARClayer) 45, and a resist 46 are laminated in this order on the layer 36Aconstituting the second metal 36. The first metal 27, the layer 28A, thelayer 29A, the layer 30A, the layer 31A, and the layer 32A are formedbelow the layer 36A in the memory cell region Ar1. An interlayerinsulator layer 36B is formed below the layer 36A in the peripheralregion Ar2.

In the memory cell region Ar1, the resist 46 is extended in parallelwith the column direction, and the resist 46 includes linear portions 46a that are formed at second intervals (second interval>first interval)in the row direction.

As illustrated in FIGS. 14A and 14B, in the peripheral region Ar2, theresist 46 located at a (

-   2n−-   1)-th (n is a positive integer) position in the row direction from    the predetermined position has a projection 46 b on one end side in    the column direction of the linear portion 46 a.

The projection 46 b is projected with a predetermined length in thecolumn direction so as to be extended in the row direction. Theprojection 46 b is integral with the linear portion 46 a.

As illustrated in FIGS. 14A and 14B, in the peripheral region Ar2, theresist 46 located at a

-   2n-th position in the row direction from the predetermined position    has the two projections 46 b on the other end side in the column    direction of the linear portion 46 a.

As illustrated in FIGS. 14A and 14B, in the peripheral region Ar2, theresist 46 has an island portion 46 c. The island portion 46 c isprovided while separated from the linear portion 46 a and the projection46 b.

In summary, the process illustrated in FIGS. 14A and 14B is a processfor forming the hard mask layer 41 (first mask) and the silicon nitridemask layer 42 (first mask) on the laminated structure whose uppermostlayer is the layer 36A.

As illustrated in FIG. 15, the antireflection coating layer (ARC layer)45 and the amorphous silicon mask layer 44 are etched with the resist 46as the mask. The resist 46 is removed after the etching.

As illustrated in FIG. 16, the antireflection coating layer 45 isremoved.

As illustrated in FIGS. 17A and 17B, the sacrifice layer 43 is etchedwith the amorphous silicon mask layer 44 as the mask. Therefore, thesacrifice layer 43 is formed into the shape similar to that of theresist 46. That is, as with the resist 46, the sacrifice layer 43 isformed so as to include the linear portion 43 a, the projection 43 b,and the island portion 43 c.

As illustrated in FIG. 18, a slimming process is performed to thesacrifice layer 43. Through the slimming process, the width of thesacrifice layer 43 is decreased.

As illustrated in FIGS. 19A and 19B, the amorphous silicon mask layer 44is removed.

In summary, the process illustrated in FIGS. 15 to 19B is a process forforming the sacrifice layer 43 (second mask) having the predeterminedpattern on the silicon nitride mask layer 42 (first mask).

As illustrated in FIG. 20, a spacer layer (a-Si) 47 is formed such thatthe upper surface and side face of the sacrifice layer 43 and the uppersurface of the silicon nitride mask layer 42 are covered therewith.

As illustrated in FIGS. 21A and 21B, the spacer layer 47 on the uppersurface of the sacrifice layer 43 and the spacer layer 47 on the uppersurface of the silicon nitride mask layer 42 are removed. That is, thespacer layer 47 is left only on the sidewall of the sacrifice layer 43.

In summary, the process illustrated in FIGS. 20 to 21B is a process forforming the spacer layer 47 (third mask) on the sidewall of thesacrifice layer 43 (second mask).

As illustrated in FIGS. 22A and 22B, a resist 48 is formed such that theprojection 43 b and island portion 43 c of the sacrifice layer 43 arecovered therewith. In other words, the resist 48 is formed such that thelinear portion 43 a of the sacrifice layer 43 is removed.

As illustrated in FIGS. 23A and 23B, the linear portion 43 a of thesacrifice layer 43 is etched and removed with the resist 48 as the mask.

As illustrated in FIG. 24, the resist 48 is removed.

In summary, the process illustrated in FIGS. 22 to 24 is a process forremoving the sacrifice layer 43 (second mask) in the first region.

As illustrated in FIGS. 25A and 25B, in the peripheral region Ar2, aresist 49 is formed near an end portion in the first direction such thatthe loop spacer layer 47 is partially exposed.

As illustrated in FIG. 26, the spacer layer 47 is etched with the resist49 as the mask such that the loop spacer layer 47 is partially cut.

As illustrated in FIGS. 27A and 27B, the resist 49 is removed.

As illustrated in FIG. 28, the silicon nitride mask layer 42 is etchedwith the spacer layer 47 and the sacrifice layer 43 as the mask.

As illustrated in FIG. 29, the hard mask layer 41 is etched with thespacer layer 47, the sacrifice layer 43, and the silicon nitride masklayer 42 as the mask.

As illustrated in FIG. 30, the memory layer MC is etched with thesilicon nitride mask layer 42 and the hard mask layer 41 as the mask.After the process of FIG. 30, the silicon nitride mask layer 42 and thehard mask layer 41 are removed. The detailed description of the processof FIGS. 11 and 12 is ended. The process of the laminated structure fromthe first metal 27 to the second electrode 32 of FIGS. 8 to 10 issubstantially similar to the process of FIGS. 14A to 30 only except thatthe process direction is changed by 90°.

In summary, the process illustrated in FIGS. 28 to 30 is a process foretching the hard mask layer 41 (first mask), the amorphous silicon layer42, and the laminated structure with the spacer layer 47 (third mask) inthe first region. The process illustrated in FIGS. 28 to 30 is also aprocess for etching the silicon nitride mask layer 42 (first mask), thehard mask layer 41 (first mask), and the laminated structure with thespacer layer 47 (third mask) and the sacrifice layer 43 (second mask) inthe predetermined second region different from the first region.

Effect of Nonvolatile Semiconductor Memory Device of First Embodiment

An effect of the nonvolatile semiconductor memory device of the firstembodiment will be described below. The nonvolatile semiconductor memorydevice of the first embodiment is formed in the above-described way, sothat the first metal 27 and the second metal 36 can be formed withoutcomplicating the shapes of the first metal 27 and second metal 36 so asto establish the contact with the contact plug.

The nonvolatile semiconductor memory device of the first embodiment isformed by the etching while the sacrifice layer 43 and the spacer layer47 formed on the sidewall of the sacrifice layer 43 are used as themask. Accordingly, the first metal 27 and the second metal 36 can beprocessed thinner than a lithography limit value with the finer pitch(for example, the width of 40 nm or less). That is, the occupied areacan be reduced in the nonvolatile semiconductor memory device of thefirst embodiment.

Second Embodiment Specific Configuration of Nonvolatile SemiconductorMemory Device of Second Embodiment

A specific configuration of a nonvolatile semiconductor memory deviceaccording to a second embodiment of the present invention will bedescribed with reference to FIGS. 31 and 32. FIG. 31 is a top viewillustrating a first metal 27′ and a second metal 36′ of the nonvolatilesemiconductor memory device of the second embodiment. FIG. 32 is a viewschematically explaining a contact plug of the nonvolatile semiconductormemory device of the second embodiment. In the second embodiment, thesame component as the first embodiment is designated by the samenumeral, and the description is omitted.

The nonvolatile semiconductor memory device of the second embodimentincludes the first metal 27 similar to that of the first embodiment anda first metal 27′ having a shape different from that of the firstembodiment. The nonvolatile semiconductor memory device of the secondembodiment includes the second metal 36 similar to that of the firstembodiment and a second metal 36′ having a shape different from that ofthe first embodiment.

The first metal 27′ will be described with reference to FIG. 31.

Referring to FIG. 31, in the peripheral region Ar2, the first metal 27′includes a contact connecting portion 27 d whose width in the rowdirection is lower than that of the first embodiment. For example, thewidth in the row direction of the contact connecting portion 27 d isformed so as to be substantially equal to the width in the columndirection of the linear portion 27 a. The contact connecting portion 27d is formed such that the contact plug contacts the side face of thecontact connecting portion 27 d.

Similarly, in the peripheral region Ar2, the second metal 36′ includes acontact connecting portion 36 d whose width in the column direction islower than that of the first embodiment. For example, the width in thecolumn direction of the contact connecting portion 36 d is formed so asto be substantially equal to the width in the row direction of thelinear portion 36 a. The contact connecting portion 36 d is formed suchthat the contact plug contacts the side face of the contact connectingportion 36 d.

A configuration of the contact plug of the second embodiment will bedescribed with reference to FIG. 32. Referring to FIG. 32, thenonvolatile semiconductor memory device of the second embodimentincludes a contact plug different from that of the first embodiment.Referring to FIG. 32, the upper layer portion is formed on the siliconsubstrate 51 while roughly including seven layers (first layer La1 toseventh layer La7). The first layer La1 has the configuration similar tothat of the first layer L1 of the first embodiment.

As illustrated in FIG. 32, as with the first embodiment, the word linesWLia and WLic are formed by the first metal 27. On the other hand, wordlines WLib′ and WLid′ are formed by the first metal 27′ different fromthat of the first embodiment. Bit lines BLia′ and BLic′ are formed bythe second metal 36′ different from that of the first embodiment. On theother hand, as with the first embodiment, the bit lines BLib and BLidare formed by the second metal 36.

As illustrated in FIG. 32, the nonvolatile semiconductor memory deviceof the second embodiment includes contact plugs ZWa11, ZWa21 to ZWa23,ZWa31, ZWa32, and ZWa41 that electrically connect the word lines WLia toWLid′ to one another in the laminating direction. The nonvolatilesemiconductor memory device of the second embodiment includes contactplugs ZBa1 to ZBa3 that electrically connect the bit lines BLia′ to BLidto one another in the laminating direction.

The word line WLia, the bit line BLia′, and the word line WLib′ areformed from the lower layer to the upper layer in the third layer La3.The bit line BLib is formed in the fourth layer La4. The word line WLic,the bit line BLic′, and the word line WLid′ are formed from the lowerlayer to the upper layer in the fifth layer La5. The bit line BLid isformed in the sixth layer La6.

According to the expression method similar to that of the firstembodiment, a relationship between the contact plug of the secondembodiment and the formed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZWa11→La2-   ZWa21 to ZWa23→La2 to La3-   ZWa31→La4-   ZWa32→La4 to La5-   ZWa41→La6-   ZBa1→La2 to La3-   ZBa2→La4 to La5-   ZBa3→La6

According to the expression method similar to that of the firstembodiment, a connection relationship by the contact plug of the secondembodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   WLia(27 b)-ZWa11-M1-   WLib′(27 d)-ZWa21-M1-   WLic(27 b)-ZWa31-BLib(36 c)-ZWa22-M1-   ZWa41-ZWa32-WLid′(27 d)-ZWa32-BLib(36 c)-ZWa23-M1-   ZBa3-BLid(36 b)-ZBa2-BLic′(36 d)-ZBa2-BLib(36 b)-ZBa1-BLia′(36    d)-ZBa1-M1

In the connection relationship by the contact plug, the contact plugsZWa21 and ZWa32 (ZBa1 and ZBa2) have the structures in which the contactplugs are extended in the laminating direction while contacting the sideportion of the contact connecting portion 27 d (36 d).

Effect of Nonvolatile Semiconductor Memory Device of Second Embodiment

An effect of the nonvolatile semiconductor memory device of the secondembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the second embodiment has theconfiguration that is substantially similar to that of the firstembodiment. Accordingly, the nonvolatile semiconductor memory device ofthe second embodiment has the effect similar to that of the firstembodiment.

Further, unlike the first embodiment, in the nonvolatile semiconductormemory device of the second embodiment, the contact connecting portion27 d (36 d) is formed such that the contact plug contacts the sideportion thereof. The contact plugs ZWa21 and ZWa32 (ZBa1 and ZBa2) havethe structures in which the contact plugs ZWa21 and ZWa32 are extendedin the laminating direction while contacting the side portion of thecontact connecting portion 27 d (36 d). Therefore, the nonvolatilesemiconductor memory device of the second embodiment is formed by theseven layers that are fewer than the 11 layers of the first embodiment.Accordingly, the nonvolatile semiconductor memory device of the secondembodiment can be produced through the process that is simpler than thatof the first embodiment.

Third Embodiment Specific Configuration of Nonvolatile SemiconductorMemory Device of Third Embodiment

A specific configuration of a nonvolatile semiconductor memory deviceaccording to a third embodiment of the present invention will bedescribed with reference to FIG. 33. FIG. 33 is a view schematicallyexplaining a contact plug of the nonvolatile semiconductor memory deviceof the third embodiment. In the third embodiment, the same component asthe first and second embodiments is designated by the same numeral, andthe description is omitted.

The nonvolatile semiconductor memory device of the third embodiment isformed with the number of laminated layers different from those of thefirst and second embodiments. The nonvolatile semiconductor memorydevice of the third embodiment includes unit cell arrays MAT01′ toMAT04′ different from those of the first and second embodiments.

Referring to FIG. 33, the upper layer portion is formed on the siliconsubstrate 51 while roughly including five layers (first layer Lb1 toseventh layer Lb5). The first layer Lb1 has the configuration similar tothat of the first layer L1 of the first embodiment.

The unit cell array MAT01′ includes a word line WLia′ and the bit lineBLia′. The word line WLia′ and the bit line BLia′ are formed in thesecond layer Lb2. The word line WLia′ is located above the bit lineBLia′. The word line WLia′ is formed by the first metal 27′.

Similarly the unit cell array MAT02′ includes a word line WLib′ and thebit line BLib. The word line wLib′ and the bit line BLib are formed inthe third layer Lb3. The word line WLib′ is located above the bit lineBLib.

The unit cell array MAT03′ includes a word line WLic′ and the bit lineBLic′. The word line WLic′ and the bit line BLic′ are formed in thethird layer Lb3. The word line WLic′ is located above the bit lineBLic′. The word line WLic′ is formed by the first metal 27′.

The unit cell array MAT04′ includes a word line WLid′ and the bit lineBLid. The word line WLid′ and the bit line BLid are formed in the fourthlayer Lb4. The word line WLid′ is located above the bit line BLid.

The nonvolatile semiconductor memory device of the third embodimentincludes contact plugs ZWb11 to ZWb14, ZWb21 to ZWb23, and ZWb31 thatelectrically connect the word lines WLia′ to WLid′ to one another in thelaminating direction. The nonvolatile semiconductor memory device of thethird embodiment includes contact plugs ZBb1 to ZBb3 that electricallyconnect the bit lines BLia′ to BLid to one another in the laminatingdirection.

According to the expression method similar to that of the firstembodiment, a relationship between the contact plug of the thirdembodiment and the formed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZWb11 to ZWb14→Lb2-   ZWb21 to ZWb23→Lb3-   ZWb31→Lb4-   ZBb1→Lb2-   ZBb2→Lb3-   ZBb3→Lb4

According to the expression method similar to that of the firstembodiment, a connection relationship by the contact plug of the thirdembodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   WLia′(27 d)-ZWb11-M1-   WLib′(27 d)-ZWb21-BLib(36 c)-ZWb12-M1-   WLic′(27 d)-ZWb22-BLib(36 c)-ZWb13-M1-   WLid′(27 d)-ZWb31-BLid(36 c)-ZWb23-BLib(36 c)-ZWb14-M1-   ZBb3-BLid(36 b)-ZBb2-BLic′(36 d)-ZBb2-BLib(36 b)-ZBb1-BLia′(36    d)-ZBb1-M1

In the connection relationship by the contact plug, the contact plugsZWb11, ZWb21, ZWb22, and ZWb31 (ZBb1 and ZBb2) have the structures inwhich the contact plugs are extended in the laminating direction whilecontacting the side portion of the contact connecting portion 27 d (36d).

Effect of Nonvolatile Semiconductor Memory Device of Third Embodiment

An effect of the nonvolatile semiconductor memory device of the thirdembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the third embodiment has theconfiguration that is substantially similar to that of the firstembodiment. Accordingly, the nonvolatile semiconductor memory device ofthe third embodiment has the effect similar to that of the firstembodiment.

Further, the nonvolatile semiconductor memory device of the thirdembodiment is formed by the five layers that are fewer than the sevenlayers of the second embodiment. Accordingly, the nonvolatilesemiconductor memory device of the third embodiment can be producedthrough the process that is simpler than that of the second embodiment.

Fourth Embodiment Specific Configuration of Nonvolatile SemiconductorMemory Device of Fourth Embodiment

A specific configuration of a nonvolatile semiconductor memory deviceaccording to a fourth embodiment of the present invention will bedescribed with reference to FIG. 34. FIG. 34 is a view schematicallyexplaining a contact plug of the nonvolatile semiconductor memory deviceof the fourth embodiment. In the fourth embodiment, the same componentas the first to third embodiments is designated by the same numeral, andthe description is omitted.

As with the third embodiment, the nonvolatile semiconductor memorydevice of the fourth embodiment includes the unit cell arrays MAT01′ toMAT04′.

Referring to FIG. 34, the unit cell array MAT01′ includes a word lineWLia″ and a bit line BLia″, which are different from those of the firstto third embodiments. The unit cell array MAT02′ includes the bit lineBLib and a word line WLib″ that is different from those of the first tothird embodiments. The unit cell array MAT03′ includes a word line WLic″and a bit line BLic″, which are different from those of the first tothird embodiments. The unit cell array MAT04′ includes the bit line BLidand a word line WLid″ that is different from those of the first to thirdembodiments.

The word lines WLia″ to WLid″ have a shape in which a through-hole 27 bais made in the contact connecting portion 27 b. The bit lines BLia″ andBLic″ have a shape in which a through-hole 36 ba is made in the contactconnecting portion 36 b.

Unlike the third embodiment, the contact plug ZWb11 is formed such thatthe through-hole 27 ba of the word line WLia″ is pierced therethrough.The contact plug ZWb21 is formed such that the through-hole 27 ba of theword line WLib″ is pierced therethrough. The contact plug ZWb22 isformed such that the through-hole 27 ba of the word line WLic″ ispierced therethrough. The contact plug ZWb31 is formed such that thethrough-hole 27 ba of the word line WLid″ is pierced therethrough.

Unlike the third embodiment, the contact plug ZBb1 is formed such thatthe through-hole 36 ba of the bit line BLia″ is pierced therethrough.The contact plug ZBb2 is formed such that the through-hole 36 ba of thebit line BLic″ is pierced therethrough.

Effect of Nonvolatile Semiconductor Memory Device of Forth Embodiment

An effect of the nonvolatile semiconductor memory device of the fourthembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the fourth embodiment has theconfiguration that is substantially similar to that of the thirdembodiment. Accordingly, the nonvolatile semiconductor memory device ofthe fourth embodiment has the effect similar to that of the thirdembodiment.

Fifth Embodiment Specific Configuration of Nonvolatile SemiconductorMemory Device of Fifth Embodiment

A specific configuration of a nonvolatile semiconductor memory deviceaccording to a fifth embodiment of the present invention will bedescribed with reference to FIG. 35. FIG. 35 is a view schematicallyexplaining a contact plug of the nonvolatile semiconductor memory deviceof the fifth embodiment. In the fifth embodiment, the same component asthe first to fourth embodiments is designated by the same numeral, andthe description is omitted.

Referring to FIG. 35, the upper layer portion is formed on the siliconsubstrate 51 while roughly including three layers (first layer Lc1 tothird layer Lc3). The first layer Lc1 has the configuration similar tothat of the first layer L1 of the first embodiment.

As with the third embodiment, the nonvolatile semiconductor memorydevice of the fifth embodiment includes the unit cell arrays MAT01′ toMAT04′.

As illustrated in FIG. 35, the unit cell array MAT01′ includes the wordline WLia′ and the bit line BLia″. The unit cell array MAT02′ includesthe word line WLib′ and the bit line BLib″. The unit cell array MAT03′includes the word line WLic′ and the bit line BLic″. The unit cell arrayMAT04′ includes the word line WLid′ and the bit line BLid″. The bitlines BLib″ and BLid″ have a shape in which the through-hole 36 ba ismade in the contact connecting portion 36 b. A diameter of thethrough-hole 36 ba is formed so as to be decreased from the bit linesBLid″ to BLia″ (from the upper layer to the lower layer).

The bit line BLia″, the word line WLia′, the bit line BLib″, the wordline WLib′, the bit line BLic″, the word line WLic′, the bit line BLid″,and the word line WLid′ are formed in the second layer Lc2 from thelower layer to the upper layer.

The nonvolatile semiconductor memory device of the fifth embodimentincludes contact plugs ZWc11 to ZWc14 that electrically connect the wordlines WLia′ to WLid′ to one another in the laminating direction. Thenonvolatile semiconductor memory device of the fifth embodiment includesa contact plug ZBc1 that electrically connects the bit lines BLia″ toBLid″ to one another in the laminating direction.

According to the expression method similar to that of the firstembodiment, a relationship between the contact plug of the fifthembodiment and the formed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZWc11 to ZWc14→Lc2-   ZBc1→Lc2

According to the expression method similar to that of the firstembodiment, a connection relationship by the contact plug of the fifthembodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   WLia′(27 d)-ZWc11-M1-   WLib′(27 d)-ZWc12-M1-   WLic′(27 d)-ZWc13-M1-   WLid′(27 d)-ZWc14-M1-   ZBc1-BLid″(36 ba)-ZBc1-BLic″(36 ba)-ZBc1-BLib″(36 ba)-ZBc1-BLia′(36    ba)-ZBc1-M1

In the connection relationship by the contact plug, the contact plugsZWc11, ZWc12, ZWc13, and ZWc14 have the structures in which the contactplugs are extended in the laminating direction while contacting the sideportion of the contact connecting portion 27 d. The contact plug ZBc1 isformed such that the through-hole 36 ba of the bit lines BLia″ to BLid″is pierced therethrough. That is, the diameter of the contact plug ZBc1is formed so as to be decreased in a stepwise manner from the bit linesBLid″ to BLia″ (from the upper layer to the lower layer).

Effect of Nonvolatile Semiconductor Memory Device of Fifth Embodiment

An effect of the nonvolatile semiconductor memory device of the fifthembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the fifth embodiment has theconfiguration that is substantially similar to that of the fourthembodiment. Accordingly, the nonvolatile semiconductor memory device ofthe fifth embodiment has the effect similar to that of the fourthembodiment.

Further, the nonvolatile semiconductor memory device of the fifthembodiment is formed by the three layers that are fewer than the fivelayers of the fourth embodiment. Accordingly, the nonvolatilesemiconductor memory device of the fifth embodiment can be producedthrough the process that is simpler than that of the fourth embodiment.

Sixth Embodiment Schematic Configuration of Nonvolatile SemiconductorMemory Device of Sixth Embodiment

A nonvolatile semiconductor memory device according to a sixthembodiment of the present invention will be described with reference toFIGS. 36 and 37. In the sixth embodiment, the same component as thefirst to fifth embodiments is designated by the same numeral, and thedescription is omitted.

The nonvolatile semiconductor memory device of the sixth embodiment hasa configuration of FIG. 36. FIG. 36 is a perspective view illustrating aunit cell array MATa of the sixth embodiment. Referring to FIG. 36, thenonvolatile semiconductor memory device of the sixth embodiment includesa unit cell array MATa that is different from those of the first tofifth embodiments.

As illustrated in FIG. 36, the unit cell array MATa includes plural bitlines BLL1 i, plural word lines WLL1 i, plural bit lines BLL2 i, pluralword lines WLL2 i, plural bit lines BLL3 i, plural word lines WLL3 i,plural bit lines BLL4 i, plural word lines WLL4 i, plural bit lines BLL5i from the lower layer to the upper layer.

FIG. 37 is a sectional view taken on a line II-II′of FIG. 36. The wordline WLL1 i is shared by the memory cells MC0 and MC1 that are locatedon and beneath the word line WLL1 i, the bit line BLL1 i is shared bythe memory cells MC1 and MC2 that are located on and beneath the bitline BLL1 i, and the word line WLL2 i is shared by the memory cells MC2and MC3 that are located on and beneath the word line WLL2 i. The wordlines WLL3 i and WLL4 i and the bit lines BLL2 i to BLL4 i are alsoshared by the memory cells that are located on and beneath the wordlines and the bit lines.

The word lines WLL1 i and WLL3 i are formed by the first metal 27. Theword lines WLL2 i and WLL4 i are formed by the first metal 27′. The bitlines BLL1 i to BLL4 i are formed by the second metal 36′. The bit lineBLL5 i is formed by the second metal 36.

Specific Configuration of Nonvolatile Semiconductor Memory Device ofSixth Embodiment

A specific configuration of the nonvolatile semiconductor memory deviceof the sixth embodiment will be described with reference to FIG. 38.FIG. 38 is a view schematically explaining a contact plug of thenonvolatile semiconductor memory device of the sixth embodiment.

Referring to FIG. 38, the upper layer portion is formed on the siliconsubstrate 51 while roughly including six layers (first layer Ld1 tosixth layer Ld6). The first layer Ld1 has the configuration similar tothat of the first layer L1 of the first embodiment.

The unit cell array MATa is formed in the second layer Ld2 to fourthlayer Ld4.

As illustrated in FIG. 38, the nonvolatile semiconductor memory deviceof the sixth embodiment includes contact plugs ZWd11, ZWd12, ZWd21,ZWd22, ZWd31, and ZWd41 that electrically connect the word lines WLL1 ito WLL4 i to one another in the laminating direction. The nonvolatilesemiconductor memory device of the sixth embodiment includes contactplugs ZBd11 to ZBd15, ZBd21 to ZBd24, ZBd31, ZBd32, and ZBd41 thatelectrically connect the bit lines BLL1 i to BLL5 i to one another inthe laminating direction.

According to the expression method similar to that of the firstembodiment, a relationship between the contact plug of the sixthembodiment and the formed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZWd11 and ZWd12→Ld2-   ZWd21 and ZWd22→Ld3-   ZWd31→Ld4-   ZWd41→Ld5-   ZBd11 to ZBd15→Ld2-   ZBd21 to ZBd24→Ld3-   ZBd31 to ZBd32→Ld4-   ZBd41→Ld5

According to the expression method similar to that of the firstembodiment, a connection relationship by the contact plug of the sixthembodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   WLL3 i(27 b)-ZWd21-WLL1 i(27 b)-ZWd11-M1-   ZWd41-BLL5 i(36 c)-ZWd31-WLL4 i(27 d)-ZWd31-WLL3 i(27 c)-ZWd22-WLL2    i(27 d)-ZWd22-WLL1 i(27 c)-ZWd12-M1-   WLL1 i(27 c)-ZBd11-BLL1 i(36 d)-ZBd11-M1-   WLL3 i(27 c)-ZBd21-BLL2 i(36 d)-ZBd21-WLL1 i(27 c)-ZBd12-M1-   WLL3 i(27 c)-ZBd22-BLL3 i(36 d)-ZBd22-WLL1 i(27 c)-ZBd13-M1-   BLL4 i(36 d)-ZBd31-WLL3 i(27 c)-ZBd23-WLL1 i(27 c)-ZBd14-M1-   ZBd41-BLL5 i(36 b)-ZBd32-WLL3 i(27 c)-ZBd24-WLL1 i(27 c)-ZBd15-M1

In the connection relationship by the contact plug, the contact plugsZWd22 and ZWd31 have the structures in which the contact plugs areextended in the laminating direction while contacting the side portionof the contact connecting portion 27 d. The contact plugs ZBd11, ZBd21,ZBd22, and ZBd31 have the structures in which the contact plugs areextended in the laminating direction while contacting the side portionof the contact connecting portion 36 d.

Effect of Nonvolatile Semiconductor Memory Device of Sixth Embodiment

An effect of the nonvolatile semiconductor memory device of the sixthembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the sixth embodiment includes the wordlines WLL1 i to WLL4 i and the bit lines BLL1 i to BLL5 i, which havethe configuration substantially similar to that of the first and secondembodiments. Accordingly, the nonvolatile semiconductor memory device ofthe sixth embodiment has the effect similar to that of the firstembodiment.

Seventh Embodiment Specific Configuration of Nonvolatile SemiconductorMemory Device of Seventh Embodiment

A specific configuration of a nonvolatile semiconductor memory deviceaccording to a seventh embodiment of the present invention will bedescribed with reference to FIG. 39. FIG. 39 is a view schematicallyexplaining a contact plug of the nonvolatile semiconductor memory deviceof the seventh embodiment. In the seventh embodiment, the same componentas the first to sixth embodiments is designated by the same numeral, andthe description is omitted.

As with the sixth embodiment, the nonvolatile semiconductor memorydevice of the seventh embodiment includes the unit cell array MATa. Thenonvolatile semiconductor memory device of the seventh embodimentincludes word lines WLL1 i′and WLL3 i′ and a bit line BLL5 i′, which aredifferent from those of the sixth embodiment.

The word lines WLL1 i′ and WLL3 i′ are formed by the first metal 27′.The word lines WLL1 i′ and WLL3 i′ have the same shape. The word linesWLL2 i and WLL4 i have the same shape. The bit line BLL5 i′ is formed bythe second metal 36′.

Referring to FIG. 39, the upper layer portion is formed on the siliconsubstrate 51 while roughly including three layers (first layer Le1 tothird layer Le3). The first layer Le1 has the configuration similar tothat of the first layer L1 of the first embodiment.

The unit cell array MATa is formed in the second layer Le2.

As illustrated in FIG. 39, the nonvolatile semiconductor memory deviceof the seventh embodiment includes contact plugs ZWe1 and ZWe2 thatelectrically connect the word lines WLL1 i′ to WLL4 i to one another inthe laminating direction. The nonvolatile semiconductor memory device ofthe seventh embodiment includes contact plugs ZBe1 to ZBe5 thatelectrically connect the bit lines BLL1 i to BLL5 i′ to one another inthe laminating direction.

According to the expression method similar to that of the firstembodiment, a relationship between the contact plug of the seventhembodiment and the formed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZWe1 and ZWe2→Le2-   ZBe1 to ZBe5→Le2

According to the expression method similar to that of the firstembodiment, a connection relationship by the contact plug of the seventhembodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   WLL3 i′(27 d)-ZWe1-WLL1 i′(27 d)-ZWe1-M1-   WLL4 i(27 d)-ZWe2-WLL4 i(27 d)-ZWe2-M1-   BLL1 i(36 d)-ZBe1-M1-   BLL2 i(36 d)-ZBe2-M1-   BLL3 i(36 d)-ZBe3-M1-   BLL4 i(36 d)-ZBe4-M1-   BLL5 i′(36 d)-ZBe5-M1

In the connection relationship by the contact plug, the contact plugsZWe1 and ZWe2 have the structures in which the contact plugs areextended in the laminating direction while contacting the side portionof the contact connecting portion 27 d. The contact plugs ZBe1 to ZBe5have the structures in which the contact plugs are extended in thelaminating direction while contacting the side portion of the contactconnecting portion 36 d.

In other words, the word lines WLL1 i′ and WLL3 i′ are configured asfollows. In the seventh embodiment, the word line WLL1 i′ constitutesthe cell array (first cell array) that is provided at a predeterminedlamination position. The word line WLL3 i′ constitutes the cell array(second cell array) that is provided on the first cell array. The wordline WLL1 i′ included in the first cell array has the same shape as theword line WLL3 i′ included in the second cell array. In the seventhembodiment, the word line WLL2 i constitutes the cell array (first cellarray) that is provided at a predetermined lamination position. The wordline WLL4 i constitutes the cell array (second cell array) that isprovided on the first cell array. The word line WLL2 i included in thefirst cell array has the same shape as the word line WLL4 i included inthe second cell array.

Effect of Nonvolatile Semiconductor Memory Device of Seventh Embodiment

An effect of the nonvolatile semiconductor memory device of the seventhembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the seventh embodiment includes the unitcell array MATa having the configuration substantially similar to thatof the sixth embodiment. Accordingly, the nonvolatile semiconductormemory device of the seventh embodiment has the effect similar to thatof the sixth embodiment.

Further, the nonvolatile semiconductor memory device of the seventhembodiment is formed by the three layers that are fewer than the sixlayers of the sixth embodiment. Accordingly, the nonvolatilesemiconductor memory device of the seventh embodiment can be producedthrough the process that is simpler than that of the sixth embodiment.

Eighth Embodiment Specific Configuration of Nonvolatile SemiconductorMemory Device of Eighth Embodiment

A specific configuration of a nonvolatile semiconductor memory deviceaccording to an eighth embodiment of the present invention will bedescribed with reference to FIG. 40. FIG. 40 is a view schematicallyexplaining a contact plug of the nonvolatile semiconductor memory deviceof the eighth embodiment. In the eighth embodiment, the same componentas the first and second embodiments is designated by the same numeral,and the description is omitted.

The nonvolatile semiconductor memory device of the eighth embodimentincludes the unit cell array MATa that is similar to that of the sixthembodiment. The nonvolatile semiconductor memory device of the eighthembodiment includes bit lines BLL2 i′ and BLL4 i′, which are differentfrom that of the seventh embodiment.

The bit lines BLL2 i′ and BLL4 i are formed by the second metal 36.

Referring to FIG. 40, the upper layer portion is formed on the siliconsubstrate 51 while roughly including five layers (first layer Lf1 tosixth layer Lf5). The first layer Lf1 has the configuration similar tothat of the first layer L1 of the first embodiment.

The unit cell array MATa is formed in the second to fourth layers Lf2 toLf4.

As illustrated in FIG. 40, the nonvolatile semiconductor memory deviceof the eighth embodiment includes contact plugs ZWf11 to ZWf31 thatelectrically connect the word lines WLL1 i′ to WLL4 i to one another inthe laminating direction. The nonvolatile semiconductor memory device ofthe eighth embodiment includes contact plugs ZBf11 to ZBf31 thatelectrically connect the bit lines BLL1 i to BLL5 i′ to one another inthe laminating direction.

According to the expression method similar to that of the firstembodiment, a relationship between the contact plug of the eighthembodiment and the formed layer thereof can be expressed as follows:

<Relationship between Contact Plug and Formed Layer thereof>

-   ZWf11 to ZWf14→Lf2-   ZBf11 and ZBf12→Lf2-   ZWf21 to ZWf23→Lf3-   ZBf21 and ZBf22→Lf3-   ZWf31→Lf4-   ZBf31→Lf4

According to the expression method similar to that of the firstembodiment, a connection relationship by the contact plug of the eighthembodiment can be expressed as follows:

<Connection Relationship by Contact Plug>

-   BLL2 i′(36 c)-ZWf11-WLL1 i′(27 d)-ZWf11-M1-   BLL4 i′(36 c)-ZWf21-WLL2 i(27 d)-ZWf21-BLL2 i′(36 c)-ZWf12-M1-   BLL4 i′(36 c)-ZWf22-WLL3 i′(27 d)-ZWf22-BLL2 i′(36 c)-ZWf13-M1-   ZWf31-WLL4 i(27 d)-ZWf31-BLL4 i′(36 c)-ZWf23-BLL2 i′(36 c)-ZWf14-M1-   BLL4 i′(36 b)-ZBf21-BLL2 i′(36 b)-ZBf1-M1-   ZBf31-BLL5 i′(36 d)-ZBf31-BLL4 i′(36 c)-ZBf22-BLL3 i(36    d)-ZBf22-BLL2 i′(36 c)-ZBf12-BLL1 i(36 d)-ZBf12-M1

In the connection relationship by the contact plug, the contact plugsZWf11, ZWf21, and ZWf31 have the structures in which the contact plugsare extended in the laminating direction while contacting the sideportion of the contact connecting portion 27 d. The contact plugs ZBf11,ZBf22, and ZBf31 have the structures in which the contact plugs areextended in the laminating direction while contacting the side portionof the contact connecting portion 36 d.

Effect of Nonvolatile Semiconductor Memory Device of Eighth Embodiment

An effect of the nonvolatile semiconductor memory device of the eighthembodiment will be described below. As described above, the nonvolatilesemiconductor memory device of the eighth embodiment includes the unitcell array MATa having the configuration substantially similar to thatof the sixth embodiment. Accordingly, the nonvolatile semiconductormemory device of the eighth embodiment has the effect similar to that ofthe sixth embodiment.

Further, the nonvolatile semiconductor memory device of the eighthembodiment is formed by the five layers that are fewer than the sixlayers of the sixth embodiment. Accordingly, the nonvolatilesemiconductor memory device of the eighth embodiment can be producedthrough the process that is simpler than that of the sixth embodiment.

Other Embodiments

The nonvolatile semiconductor memory devices of the first to eighthembodiments are described above. However, the present invention is notlimited to the first to eighth embodiments, but various modifications,additions, and substitutions can be made without departing from thescope of the present invention.

For example, the present invention is not particularly limited to thememory cell structure, but the present invention can be applied tovarious cross-point type multi-layer memories such as thephase-transition memory element, the MRAM element, PFRAM, and RRAM.

For example, in the first to eighth embodiments, the positions of theword line and bit line may be changed with each other.

For example, instead of interconnection/cell/interconnection/cellillustrated in the sixth and eighth embodiments, an interlayer insulatormay be interposed between the cell array layers likeinterconnection/cell/interconnection/interlayerinsulator/interconnection/cell/interconnection.

In the producing method, the memory cell, the word line, and the bitline are formed through the self-aligned process for the laminated body.For example, the word line and the bit line may be formed through adamascene process, and the memory cell may separately be formed on orbeneath the word line and the bit line through a pillar forming process.

In the above embodiments, each of two first metal 27 (second first metal36) have alternatively contact connecting portions 27 b (36 b) at oneend side and the other end side in the row direction (the columndirection). However, as shown in FIG. 40, each of four first metal 27AA(second first metal 36AA) having alternatively contact connectingportions 27AAb (36AAb) at one end side and the other end side in the rowdirection (the column direction) may be applicable in this invention.Further, as shown in FIG. 41, each of eight first metal 27AB (secondfirst metal 36AB) having alternatively contact connecting portions 27ABb(36ABb) at one end side and the other end side in the row direction (thecolumn direction) may be applicable in this invention.

1. A nonvolatile semiconductor memory device comprising: a semiconductorsubstrate; and a cell array formed on the semiconductor substrate,including a plurality of first lines, a plurality of second linesintersecting the plurality of first lines, and a plurality of memorycells connected at intersections of the first and second lines betweenboth lines, wherein the cell array includes: a memory cell region wherethe memory cells are formed; and a peripheral region that is providedaround the memory cell region, in the memory cell region, the firstlines are extended in parallel with a first direction, and the firstlines are repeatedly formed at first intervals in a second directionorthogonal to the first direction, in the peripheral region, each of thefirst lines located at (4n−3)-th (n is a positive integer) and (4n−2)-thpositions in the second direction from a predetermined position has acontact connecting portion on one end side in the first direction of thefirst line, in the peripheral region, each of the first lines located at(4n−1)-th and 4n-th positions in the second direction from thepredetermined position has the contact connecting portion on the otherend side in the first direction of the first line, and the contactconnecting portion is formed so as to contact with a contact plugextended in a laminating direction.
 2. The nonvolatile semiconductormemory device according to claim 1, wherein the first interval is 40 nmor less.
 3. The nonvolatile semiconductor memory device according toclaim 1, wherein the cell array comprises: a first cell array that isprovided at a predetermined position in the laminating direction; and asecond cell array that is provided on or beneath the first cell array,and the first line included in the first cell array has a shapeidentical to that of the first line included in the second cell array.4. The nonvolatile semiconductor memory device according to claim 1,wherein the contact connecting portion is formed such that the contactplug contacts an upper surface or a lower surface of the contactconnecting portion.
 5. The nonvolatile semiconductor memory deviceaccording to claim 1, wherein the contact connecting portion is formedsuch that the contact plug contacts a side face of the contactconnecting portion.
 6. The nonvolatile semiconductor memory deviceaccording to claim 1, wherein the first line includes an island portionseparated from the contact connecting portion, and the island portion isformed so as to contact the contact plug.
 7. The nonvolatilesemiconductor memory device according to claim 1, wherein the memorycell comprises: a rectifying element; and a variable resistive elementthat is connected in series with the rectifying element.
 8. Thenonvolatile semiconductor memory device according to claim 1, wherein afirst contact plug connected to the contact connecting portion of thefirst line provided on a predetermined layer and a second contact plugconnected to the contact connecting portion of the first line providedon an upper layer of the predetermined layer have same upper endpositions and lower end positions in the laminating direction, the firstcontact plug is extended through the layer, in which the contactconnecting portion of the first line connected to the second contactplug is formed, to an upper layer with no contact to the contactconnecting portion.
 9. The nonvolatile semiconductor memory deviceaccording to claim 1, wherein a through-hole is made in the contactconnecting portion, and the contact plug is formed in the through-hole.10. A nonvolatile semiconductor memory device comprising: asemiconductor substrate; and a cell array formed on the semiconductorsubstrate, including a plurality of first lines, a plurality of secondlines intersecting the plurality of first lines, and a plurality ofmemory cells connected at intersections of the first and second linesbetween both lines, wherein the cell array includes: a memory cellregion where the memory cells are formed; and a peripheral region thatis provided around the memory cell region, in the memory cell region,the first lines are extended in parallel with a first direction, and thefirst lines are repeatedly formed at first intervals in a seconddirection orthogonal to the first direction, in the peripheral region,each plurality of continuous first lines alternately have contactconnecting portions one end side and the other end side in the firstdirection of the first line, and the contact connecting portion isformed so as to contact with a contact plug extended in a laminatingdirection.
 11. The nonvolatile semiconductor memory device according toclaim 10, wherein the first interval is 40 nm or less.
 12. Thenonvolatile semiconductor memory device according to claim 10, whereinthe cell array comprises: a first cell array that is provided at apredetermined position in the laminating direction; and a second cellarray that is provided above or beneath the first cell array, and thefirst line included in the first cell array has a shape identical tothat of the first line included in the second cell array.
 13. Thenonvolatile semiconductor memory device according to claim 10, whereinthe contact connecting portion is formed such that the contact plugcontacts a side face of the contact connecting portion.
 14. Thenonvolatile semiconductor memory device according to claim 10, whereinthe first line includes an island portion that is disposed whileseparated from the contact connecting portion, and the island portion isformed so as to contact the contact plug.
 15. The nonvolatilesemiconductor memory device according to claim 10, wherein the memorycell comprises: a rectifying element that is connected to the firstline; and a variable resistive element that is connected in series withthe rectifying element.
 16. The nonvolatile semiconductor memory deviceaccording to claim 10, wherein a first contact plug connected to thecontact connecting portion of the first line provided on a predeterminedlayer and a second contact plug connected to the contact connectingportion of the first line provided on an upper layer of thepredetermined layer have same upper end positions and lower endpositions in the laminating direction, the first contact plug isextended through the layer, in which the contact connecting portion ofthe first line connected to the second contact plug is formed, to anupper layer with no contact to the contact connecting portion.
 17. Thenonvolatile semiconductor memory device according to claim 10, wherein athrough-hole is made in the contact connecting portion, and the contactplug is formed in the through-hole.
 18. A nonvolatile semiconductormemory device producing method comprising: forming a laminated structureon a semiconductor substrate; and etching the laminated structure toform a cell array, the cell array including a plurality of first lines,a plurality of second lines intersecting the plurality of first lines,and a plurality of memory cells connected at intersections of the firstand second lines between both lines, wherein the method compises:forming a first mask on the laminated structure, forming a second maskhaving a predetermined pattern on a layer upper than a layer in whichthe first mask is formed, slimming the second mask, forming a third maskon a sidewall of the second mask, removing the second mask in a firstregion, etching the first mask and the laminated structure by means ofthe third mask in the first region, and etching the first mask and thelaminated structure by means of the third mask and the second mask in asecond region that is different from the first region.
 19. Thenonvolatile semiconductor memory device producing method according toclaim 18, wherein part of the laminated structure is formed into linearportions by etching with the third mask in the first region, the linearportions being extended in parallel with a first direction andrepeatedly formed at first intervals in a second direction orthogonal tothe first direction, part of the laminated structure is formed into acontact connecting portion by etching with the second and third masks inthe second region, the contact connecting portion being provided on oneend side or the other end side in the first direction of the linearportion, and the contact connecting portion is formed so as to contact acontact plug extended in a laminating direction.
 20. The nonvolatilesemiconductor memory device producing method according to claim 18,wherein the second mask and the third mask in the second region aremasked with a resist after the third mask is formed on the sidewall ofthe second mask, and the second mask is removed by etching.